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	CM-200/210
	Specifications

Hydrofluoric Acid Monitor

CM-200/210

Suitable for fluorinated acid concentration control

Measurement Principle:	Electromagnetic induction conductivity measurement
Measurement Target:	Water and hydrofluoric liquid acid
Measurement Equipment:	0Hfwt% ~ 1/2/5/10/20Hfwt% (based on order specifications)
Display:
Hydrofluoric acid concentration:	0.001% minimum detective resolution (within a range of 0% to 1%);
Warning signal:	maximum concentration, high concentration, low concentration, minimum concentration

For Semiconductor / LCD Manufacturing Processes Water Quality Meters

The HF-960M uses sensors that offer outstanding corrosion resistance for high-precision, and is thus perfect for single-bath and wafer cleaning.

The HF-700 stabilizes hydrofluoric concentrations on the order of ppm in diluted sulfuric acid and hydrogen peroxide

Ideal for ozone fluid density control in semiconductor production processes

This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.

HE-960TM offers High precision measurement of the conductivity of TMAH (Tetra Methyl Ammonium Hydroxide) solutions.

This meter enables IPA to be controlled to high purity to maintain and enhance the performance of IPA vapor (vapour) drying systems.

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