Enables management of hydrofluoric concentrations
in diluted
sulfuric acid and hydrogen peroxide at the ppm level.
Management of hydrofluoric concentrations at the ppm level is extremely important
for the solution of diluted sulfuric acid, hydrogen peroxide and a small amount of
hydrofluoric acid that plays an effective role in the removal of the polymer residue
following the etching process. If the concentration is too low, the polymer removal
effect is weakened. If it is too high, it causes excessive etching.
The HF-700 stabilizes hydrofluoric concentrations on the order
of ppm in diluted sulfuric acid and hydrogen peroxide to enable continuous
measurement and allow effective process management.
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Stable and continuous measurement
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Multiple measurement modes to fit
the application
The standard mode / A reagent-saving mode / A continuous measurement mode / An intermittent measurement mode
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Easy electrode replacement
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