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	OZ-96
	Specifications

Dissolved Ozone Monitor

OZ-96

Overview

Technologies are being developed that use ozone water in semiconductor cleaning processes and resist separation processes. This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.

Features

- Compact DIN96 size
- Simultaneous display of measured values and parameter settings
- Two-stage gain amp compatible with high concentrations
- Single detector capable of measurement of low and high concentrations
- 4-channel alarm contact
- Transmission output (DC4-20 mA)
- Simple operation confirmation mechanism
- DC 24 V power supply (CE-compatible)
- Memory backup

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Products

Inline Dissolved Ozone Monitor
OZ-96i

Ideal for ozone fluid density control in semiconductor production processes

Low Concentration Type HF/HCl/NH3 concentration Monitor
HF-960M

The HF-960M uses sensors that offer outstanding corrosion resistance for high-precision, and is thus perfect for single-bath and wafer cleaning.

Hydrofluoric Acid Monitor
CM-200/210

Suitable for fluorinated acid density control in semiconductor manufacturing processes and in various kinds of industrial fields

High Sensitive HF Concentration Monitor in Diluted sulfuric acid / Hydrogen peroxide
HF-700

The HF-700 stabilizes hydrofluoric concentrations on the order of ppm in diluted sulfuric acid and hydrogen peroxide

TMAH Conductivity Meter
HE-960TM

HE-960TM offers High precision measurement of the conductivity of TMAH (Tetra Methyl Ammonium Hydroxide) solutions.

IPA Resistivity Meter
IP-960

This meter enables IPA to be controlled to high purity to maintain and enhance the performance of IPA vapor (vapour) drying systems.

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